Micronic Sets New Standard for Advanced Photomask Productivity with the Introduction of the Sigma7500 Laser Pattern Generator
Taby, Sweden – October 4, 2005 – Micronic Laser Systems AB, a leading global supplier of laser pattern generators for photomasks, today launched the Sigma7500 system, setting a new standard in productivity and performance for advanced photomasks. The added productivity, flexibility and performance of the Sigma7500 significantly widens its application space at the 90, 65 and 45 nanometer technology nodes, both for binary and phase shift masks (PSM).
The Sigma7500 utilizes a 248 nm KrF excimer laser along with Micronic´s proprietary spatial light modulator technology, offering a unique combination of high resolution and OPC fidelity, excellent CD control, and now 1 hour and 45 minutes write time. This is an increase in productivity for the platform exceeding 40 per cent. New yield enhancement functions available in the Sigma7500 include Energy Spread Compensation and ProcessEqualizerTM to compensate for errors such as non-uniform mask processes. “Our commitment is to provide the highest productivity products and to bring cost of ownership down,” said Sven Lofquist, Micronic president and CEO. “The Sigma7500 offers semiconductor manufacturers many advantages, including faster cycle times required to meet important time-to-market demands.” Company contact: Sven Lofquist President & CEO Tel: +46 8 638 52 00 email@example.com Agency contact: Luz Rodriguez Loomis Group, Inc Tel: +33 1 58 18 59 30 firstname.lastname@example.org