Micronic and ASML sign a license agreement for optical maskless lithography

Taby, Sweden – December 21, 2004 – Micronic Laser Systems AB and ASML Netherlands B.V. in the Netherlands have today signed a license agreement that gives ASML the right to market optical maskless lithography for semiconductor applications based on Micronic’s patent portfolio in the SLM (Spatial Light Modulator) technology and datapath.

- The license agreement gives ASML exclusive rights to use Micronic’s patents related to SLM and datapath technology for optical maskless lithography for semiconductor applications. - Micronic receives royalty payment for sales of maskless lithography systems based on Micronic’s patents. - Micronic receives royalty free rights to use ASML’s development of the SLM technology for photomask applications. - Micronic receives an advance for future royalties amounting to 20 million Euros, against which future royalties will be accounted for. - The transaction will currently not affect Micronic’s result. ”Part of our strategy is to develop the value of our patent portfolio by broadening areas of applications. For Micronic this license agreement means, apart from future royalty incomes, also major synergies when it comes to the development of next generation SLM technology, which directly can be implemented to our Sigma systems,” said Sven Lofquist, Micronic president and CEO. Maskless lithography Maskless lithography provides a method for manufacturing semiconductors without using photomasks. Areas that can benefit of maskless lithography technology are for example designs for the production of small series. Company contact: Sven Lofquist, President & CEO Tel: +46 8 638 52 00 E-mail: sven.lofquist@micronic.se Agency contact: Luz Rodriguez, Loomis Group, Inc Tel: +33 1 58 18 59 30 rodriguezl@loomisgroup.com