Micronic Introduces LRS15000-TFT3 Laser Pattern Generator For Volume Production of Generation 7 Gray Tone Photomasks

Taby, Sweden – December 1, 2004 – Micronic Laser Systems today introduced a new laser pattern generation tool for volume production of leading-edge TFT-LCD photomasks. The LRS15000-TFT3, the latest addition to Micronic’s production-proven LRS pattern generator line, combines state-of-the-art resolution with a 1300 x 1500 mm maximum mask size to enable Generation 7 TFT-LCD photomask writing. The tool’s resolution of 0.75 micron also provides the capability for creating gray tone masks (GTM), a technology that saves process steps in TFT manufacturing.

The LRS15000-TFT3 features a major breakthrough for registration error elimination in large sized photomasks, a Z-correction option that removes distortion caused by mask-to-mask flatness variations, one of the biggest causes of registration errors in TFT-LCD photomasks. The Z-correction option automatically compensates for registration deviations caused by flatness non-uniformity on the rear surface of the mask and contamination beneath the mask. “This Z-correction method was originally developed for Micronic’s MMS15000 photomask metrology system, making it possible to measure registration independent of these common error sources,” said Ulf Sundstrom, Micronic Sr.Vice President, Corporate Sales. “Incorporating this technology into our latest TFT-LCD photomask writing tool enables users to correct the pattern before writing, resulting in better quality photomasks. Ultimately, this ability translates to better manufacturing yields and higher performing displays.” Company contact: Ulf Sundstrom Sr.Vice President, Corporate Sales Tel: +46 8 638 52 00 ulf.sundstrom@micronic.se Agency contact: Luz Rodriguez Loomis Group, Inc Tel: +33 1 58 18 59 30 rodriguezl@loomisgroup.com