Micronic Introduces Omega6800 and Omega6080 Laser Pattern Generators at Photomask Japan

Taby, Sweden – April 13, 2005 – Following recent successes for its Omega6000 Series in Japan and Asia, Micronic Laser Systems AB today introduced two new laser pattern generators for volume mask production at the Photomask Japan symposium.

The new Omega6800 is a high-accuracy and high-productivity raster-scan laser writer for semiconductor reticles down to the 130 nm design node. Featuring Micronic’s latest advances in mura control functions, the Omega6800 further reduces microscopic systematic deviations in CCD/CMOS image sensor masks, as well as in masks for small displays, DRAM, SRAM and other mura-sensitive devices. New optics provide improved CD linearity and clear-field/dark-field deviation, and a new bias method enhances CD accuracy for all angles, important for X-design interconnects and other designs with angled features. The second new tool, Omega6080, incorporates many of the improved functions. It is designed for extreme productivity for reticles down to the 250 nm design node and can produce 15-20 reticles per day. The Omega6080 offers a modern, accurate and good cost-of-ownership alternative to costly legacy e-beam systems. “The Omega6800 and the Omega6080 are the latest examples of Micronic’s determination to improve the features of this platform, and to enhance the capabilities for, among other segments, the increasingly important product segment of CCD and CMOS image sensors for digital cameras and camera phones,” said Sven Lofquist, Micronic president and CEO. “Micronic’s Omega6000 laser pattern generators are used by photomask makers worldwide, which underscores the industry’s endorsement of our tools, our technology and our commitment to the advanced semiconductor segment.” The successful Omega6000 platform features Micronic’s leading laser raster scanner technology for standard i-line process. The platform’s combination of high resolution and high throughput makes it ideal for volume manufacturing of advanced photomasks. The highly flexible architecture provides laser pattern generation capability for advanced semiconductor, image sensors and display photomasks. Company contact: Sven Lofquist President & CEO Tel: +46 8 638 52 00 sven.lofquist@micronic.se Agency contact: Luz Rodriguez Loomis Group, Inc Tel: +33 1 58 18 59 30 rodriguezl@loomisgroup.com