Micronic Launches the FPS5100 Laser Pattern Generator for Volume Production of Advanced Electronic Packaging Photomasks

TABY, Sweden – June 14, 2006 – Micronic Laser Systems AB (Stockholm Exchange’s “O list”: MICR), a leading global supplier of laser pattern generators for photomasks, today introduced the FPS5100. The system is a brand new tool for high-volume production of photomasks for advanced electronic packaging, passive matrix TN/STN LCDs and other large area applications.

“The FPS5100 significantly broadens the company’s state-of-the-art product offerings for mature display and advanced packaging applications,” said Ulf Sundstrom, Micronic Sr. Vice President Corporate Sales. “It also affirms our commitment to be the leading provider of pattern generators.” Manufactured for flexibility, productivity and stability, the FPS5100 is based on Micronic’s LRS line of pattern generators, the industry standard for large-area display photomask applications. The new tool provides the lowest cost of ownership in its application space, shorter turn-around times and easier production planning for mask makers. The system features a very high throughput up to 12,000 mm2/min and a main writing grid down to 0.4µm. Company contact: Ulf Sundstrom Sr.Vice President, Corporate Sales Tel: +46 8 638 52 00 ulf.sundstrom@micronic.se Agency contact: Luz Rodriguez Loomis Group, Inc Tel: +33 1 58 18 59 30 rodriguezl@loomisgroup.com