Micronic Receives a Repeat Order for Advanced TFT-LCD Photomask Pattern Generation Tool From Asia
Micronic Receives a Repeat Order for Advanced TFT-LCD Photomask Pattern Generation Tool From Asia Taby, Sweden - November 10, 2003 - Micronic Laser Systems AB (Stockholmsborsen's Attract 40: MICR), a leading manufacturer of laser pattern generation equipment to the display and semiconductor industries, today announced receipt of a repeat order from an Asian customer for an LRS series pattern generation tool for advanced TFT-LCD photomasks. The system will be delivered in 2005. "This order is yet another confirmation that the TFT industry is currently experiencing a tremendous boom. Micronic is pleased to be able to respond to this high demand, which also confirms the confidence that our customers place in our products," said Sven Lofquist, president and CEO of Micronic Laser Systems AB. Company contact: Carl-Johan Blomberg Sr VP & CFO Tel: +46 8 638 52 00 carl-johan.blomberg@micronic.se Agency contact: Vincent Mayeda The Loomis Group, Inc. Tel: +1 415 882 9494 vincent@loomisgroup.com About Micronic Laser Systems AB Micronic Laser Systems is a Swedish high-tech company engaged in the development, manufacture and marketing of a series of extremely accurate laser pattern generators for the production of photomasks. The technology involved is known as microlithography. Micronic's product offering also includes metrology systems for display photomasks. Micronic's systems are used by the world's leading electronics companies in the manufacture of television and computer displays, semiconductor circuits and semiconductor packaging components. Micronic is located in Taby, north of Stockholm and at present has subsidiaries in the United States, Japan and Taiwan. Micronic maintains a web site at: http://www.micronic.se ------------------------------------------------------------ This information was brought to you by Waymaker http://www.waymaker.net The following files are available for download: http://www.waymaker.net/bitonline/2003/11/10/20031110BIT20070/wkr0005.pdf Complete document