Micronic receives order for an Omega6600 Series Laser Pattern Generator

Taby, Sweden – November 25, 2004 – Micronic Laser Systems AB (Stockholmsborsen's Attract 40: MICR) has received an order from an Asian customer for an Omega6600 laser photomask pattern generator for use in volume production of semiconductor photomasks. The tool is scheduled to ship during 2005.

“Photomask manufacturers in Asia and throughout the world continue to choose the Omega6600 laser pattern generation tool for volume production of today’s advanced semiconductor photomasks,” said Sven Lofquist, Micronic president and CEO. “We are very pleased that the best-in-class Omega6600 remains the preferred pattern generator for volume production of photomasks as maskmakers continue to add capacity.” Omega6600 is Micronic’s most advanced laser raster scanner for standard i-line process, built on the production-proven Omega6000 platform. The tool’s combination of high throughput and leading-edge i-line resolution makes it ideal for performing volume manufacturing of advanced photomasks as well as optical sensor devices. Company contact: Sven Lofquist President & CEO . Tel: +46 8 638 52 00 sven.lofquist@micronic.se Agency contact: Luz Rodriguez Loomis Group, Inc Tel: +33 1 58 18 59 30 rodriguezl@loomisgroup.com