Micronic Receives Order for Omega6080 Laser Pattern Generator

TABY, Sweden – December 30, 2005 – Micronic Laser Systems AB (Stockholm Stock Exchange’s “Attract 40 list”: MICR), a leading global supplier of laser pattern generators for photomasks, said today it has received an order for an Omega6080 laser pattern generator. The Omega6080 is designed for high-volume production of semiconductor photomasks, typically meeting critical-layer requirements at the 250 nm technology node.

“More than half of the semiconductor photomasks produced have feature sizes corresponding to 250 nm design rules or higher,” said Sven Lofquist, Micronic president and CEO. “The Omega6080 offers a very high productivity and low cost of ownership alternative to the aging e-beam and laser pattern generation tools used to produce these photomasks today.” The Omega6080 is the latest development of Micronic´s successful Omega6000 raster scan platform, used by leading photomask manufacturers world-wide. Company contact: Sven Lofquist President & CEO Tel: +46 8 638 52 00 sven.lofquist@micronic.se Agency contact: Luz Rodriguez Loomis Group, Inc Tel: +33 1 58 18 59 30 rodriguezl@loomisgroup.com