Micronic receives order for two pattern generators of a new generation for the production of display photomasks

Täby, Sweden – September 6, 2007 – Micronic Laser Systems AB (OMX Nordic Exchange Stockholm, Nordic list, Mid Cap, Information Technology: MICR), a leading global supplier of laser pattern generators for photomasks, has today received an order for two pattern generators for the production of display photo¬masks from a customer in Japan. The systems will be used to produce advanced photomasks including next generation dis¬play manufacturing, so called G10. These photomasks will enable cost effective production of display sizes over 60”.

”This is the largest order in the company’s history,” said Sven Löfquist, president and CEO of Micronic Laser Systems. “The market for pattern generators for display photomasks has been standing still for more than a year, which is challenging, but cyclical buying is not unusual for the capital equipment industry serving strong growth markets. We now see a gradual recovery in demand for pattern generators, mainly driven by the technology development in terms of systems for larger photomasks in combination of higher precision, image quality and productivity. This double order involves some degree of new development with an emphasis on larger writing area. The first system is scheduled for delivery in the second half of 2008.”

“The development of new generation fabs leads to a more cost effective production of display panels. It is very satisfying that Micronic’s systems continue to play a central role in the development of the display industry, which is rapidly approaching 100 billion US dollars,” concluded Sven Löfquist.




Company contact:
Sven Löfquist
President and CEO
Tel: +46 8 638 52 00
sven.lofquist@micronic.se