Micronic Technical Seminar in Taiwan to Focus on Latest Developments in Pattern Generation Production, R&D and Customer Support

Taby, Sweden – September 27, 2005 – Micronic Laser Systems AB, a leading global supplier of laser pattern generators for photomasks, will present the latest developments in volume-production performance, R&D and support at a technical seminar for customers, associates and prospective customers on Sept. 27 in Hsinchu, Taiwan.

The one-day seminar features presentations by experts on the pattern-generation market and a leading industry speaker, Dr. Wei-Xin Ni, General Director of Taiwan’s National Nano Device Laboratories (NDL). “Micronic Laser Systems has had strong relationships with the leading global mask makers in Taiwan since 1997, and this technical seminar is one way to show our appreciation of their business, as well as to emphasize our commitment to providing high-production equipment and world-class service,” said Sven Lofquist, Micronic president and CEO. “At the same time, this will be an ideal opportunity to familiarize potential customers in this key market with Micronic’s production-worthy pattern-generation tools and technology.” Micronic is represented in Taiwan by Hermes-Epitek Corp. Company contact: Sven Lofquist President & CEO Tel: +46 8 638 52 00 sven.lofquist@micronic.se Agency contact: Loomis Group, Inc Luz Rodriguez Tel: +33 1 58 18 59 30 rodriguezl@loomisgroup.com