OBDUCAT RECEIVES ESSENTIAL NIL PATENT GRANTED IN USA

OBDUCAT AB, the world leading supplier of lithography solutions based on Nano Imprint Lithography and E-beam lithography, is pleased to announce that it has received notification from the US Patent Office that patent will be issued concerning one of Obducat’s anti-stick technologies. The technology is part of the NIL (nano imprint lithography) system solution that Obducat offer for mass production purposes.

The patented anti-stick technology constitutes an important part of Obducat’s solution for HVM (High Volume Manufacturing) based on NIL. The anti-stick coating layer applied on a stamper ensures a high speed demolding process as well as a particle repellent stamp surface. This is a key functionality enabling the high quality result that Obducat’s HVM NIL solution offers.

Furthermore the process of applying the anti-stick layer is fast and straightforward with an overall low cost profile. The anti-stick layer also offers high durability, especially in high temperature applications, which also improves the overall stamp lifetime.

For further information, please contact:

Patrik Lundström, CEO, + 46 40 – 36 21 00 or 703 – 27 37 38

Henri Bergstrand, Chairman of the Board, + 46 40-36 21 00 or 708 - 88 72 45

Obducat AB is an innovative developer and supplier of technologies, products and processes used for the production and replication of advanced micro and nano structures. Obducat’s products and services are intended to serve the demands of companies within the information storage, semiconductor, printed circuit board, and sensor industries. Obducat’s technologies include electron beam and nano imprint technology. Obducat has offices in Sweden and the UK, with the head quarters located in Malmö, Sweden. The Obducat shares are publicly traded on the Swedish NGM stock exchange.

Read more at www.obducat.com