OBDUCAT RECEIVES ESSENTIAL NIL PATENT IN USA
The US Patent Office has notified Obducat that they will issue a patent for the invention concerning Obducat’s unique Soft Press™ function, representing a vital part of the Obducat NIL technology (nano imprint lithography). The technology offers performance advantages in comparison with competing technologies. Pattern transfer using Soft Press™ enables even pressure across large surfaces, creating small and highly accurate structures in thin polymer layers with very high density. Another advantage of the Soft Press™ function is that high repeatability of the imprint result is achieved, which is vital in industrial production, resulting in a high degree of cost-efficiency.
The patent regards a solution that enables the customer to obtain very even pressure across large surfaces when fabricating structures using the Obducat NIL technology. The Soft Press™ function allows the customer to produce structures in very thin polymer layers. For competing technologies this involves several additional process steps, which in turn increases the yield loss and thereby manufacturing costs. It is also possible to produce structures with very high density without losing CD (Critical Dimensions) control in the continuous manufacturing process. The Soft Press™ function also allows for high repeatability of the imprint result, which is of vital importance in industrial manufacturing. Process accuracy is crucial for the overall cost-efficiency at large scale manufacturing of electronics products.
Patrik Lundström, Obducat’s CEO, says:
" This is certainly one of the most important cornerstones in our NIL technology. At the same time the US market is important since several of our industrial customers are located there. These customers are targeting an early entry into mass production using Obducat’s NIL technology. Most of the products that customers are planning to produce are to be used in consumer electronic products. This key patent has previously been granted in Europe and China which means that our technology is covered by patents in very important geographical areas both from a manufacturing point of view as well as a end product market point of view. "
For further information, please contact:
Patrik Lundström, CEO, + 46 40 – 36 21 00 or + 46 703 – 27 37 38
Henri Bergstrand, Chairman of the Board, + 46 40-36 21 00 or + 46 708 - 88 72 45
Obducat AB is an innovative developer and supplier of technologies, products and processes used for the production and replication of advanced micro and nano structures. Obducat’s products and services are intended to serve the demands of companies within the information storage, semiconductor, printed circuit board, and sensor industries. Obducat’s technologies include electron beam and nano imprint technology. Obducat has offices in Sweden and the UK, with the head quarters located in Malmö, Sweden. The Obducat shares are publicly traded on the Swedish NGM stock exchange.
Read more at www.obducat.com