OBDUCAT NIL PATENT GRANTED IN US

Obducat has received a NIL patent granted in US. The patent encompasses an element within the nano imprint lithography (NIL) process called multi layered resist coating.

The patent focuses on so-called multi layered resist coating, facilitating a production process that enables a higher tolerance level for small structure production. The process can be used for production of stampers as well as for imprints, thus enabling a higher cost efficiency which further strengthens the overall competitive advantage NIL offers in comparison with alternative techniques.

For more information, please contact:

Patrik Lundström, CEO, +46 40 36 21 00 or +46 70 32 73 738

Henri Bergstrand, Chairman of the Board, +46 40 36 21 00

Obducat AB is an innovative developer and supplier of technologies, products and processes used for the production and replication of advanced micro and nano structures. Obducat’s products and services are intended to serve the demands of companies within the information storage, semiconductor, printed circuit board, and sensor industries. Obducat’s technologies include electron beam and nano imprint technology. Obducat has offices in Sweden and the UK, with the headquarters located in Malmö, Sweden. The Obducat shares are publicly traded on the Swedish NGM stock exchange.

Read more at www.obducat.com