Picosun’s PicoArmour[TM] reduces semiconductor manufacturing costs
ESPOO, Finland, 2[nd] of June 2021 – Picosun Group has pending patent rights for an ALD enabled corrosion protection solution against plasma etch that will bring benefits in semiconductor fabrication processes in terms of throughput, film uniformity and conformality. With PicoArmour[TM] the corrosion protection can be achieved more efficiently compared with the industry solutions commonly used today. Wafer fabrication process flows include several steps where plasma etching is necessary. An inevitable consequence of using etching chemicals is that the tool itself will be etched. A common