Micronic and Fraunhofer in co-operation over new micro patterning technology
Micronic and Fraunhofer in co-operation over new micro patterning technology Micronic and Fraunhofer in Germany are in co-operation developing a new optical micro patterning method for semiconductor reticles and other advanced lithographic applications. The technology developed by the companies will overcome the limitations associated with laser scanning systems and promises to provide the resolution and the throughput required for 130 nanometers photomasks and beyond. "This new technology will enable us to follow the roadmap for several IC technology nodes and can also be applied to other