OBDUCAT RECEIVES IMPORTANT E-BEAM LITHOGRAPHY PATENT GRANTED IN CHINA
OBDUCAT AB, the world-leading supplier of lithography solutions based on Nano Imprint Lithography and E-beam lithography, is pleased to announce that a new patent have been granted. The Chinese Patent Office has issued a patent for a technology that concerns Obducat’s Electron Beam Recording (EBR) technology. The patent is very important for the market position of Obducat especially within the application area hard disks.The issued patent concerns an exposure strategy that enables a higher accuracy of the exposed patterns on stampers for next generation hard disk technology so called “