Picosun-SINANO collaboration yields excellent TiN process
ESPOO, Finland, and SUZHOU, China, 26th September 2018 – Picosun Group, a leading, global provider of ALD (Atomic Layer Deposition) thin film coating solutions, and Suzhou Institute of Nano-Tech and Nano-Bionics (SINANO) report excellent quality titanium nitride (TiN) deposited with Picosun’s plasma-ALD technology. In microelectronic component manufacturing, the ohmic contact between metallic and semiconducting material layers is critical regarding the component functionality and lifetime. Typically, pure metals such as titanium have been employed as the metallic material, but they have